Magnetic properties of Nd–Fe–B film magnets prepared by RF sputtering |
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Authors: | W.F. Liu S. SuzukiK. Machida |
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Affiliation: | Center for Advanced Science and Innovation, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan |
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Abstract: | Highly oriented films of ∼6 μm in thickness consisting of the Nd2Fe14B compound phase were obtained by a three-dimensional sputtering method at room temperature and the subsequent crystallization by annealing. The c-axis orientation and coercivity of film samples were sensitive to the sputtering parameters and annealing conditions. The optimum temperature and time for annealing were 650 °C and 30 min to show the highest coercivity without any deterioration for the orientation of Nd2Fe14B grains, and furthermore the degree of c-axis orientation was increased by decreasing the Ar gas pressure or input power for sputtering. The resultant film magnets with good magnetic properties of Br=∼1.06 T, HC=∼371 kA/m, and (BH)max=∼160 kJ/m3 were obtained under the optimized parameters for sputtering. |
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Keywords: | 75.30.Gw 75.50.Ww 75.60.Ej |
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