The Interaction of the Supersonic Plasma-Jet with the Substrate in the RF Plasma-Chemical Reactor |
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| Authors: | M &#x;ícha Z Hubi
ka M Tichý M Novk L Soukup L Jastrabík J F Behnke V Kapi
ka K Kapoun M &#x;erý |
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| Institution: | M. ?ícha,Z. Hubi?ka,M. Tichý,M. Novák,L. Soukup,L. Jastrabík,J. F. Behnke,V. Kapi?ka,K. Kapoun,M. ?erý |
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| Abstract: | Although the plasma-chemical processes and properties of the deposited thin film can strongly depend on the interaction of the supersonic plasma jet channel with the substrate, up to now the study of this phenomenon has not yet been done. We decided to study this interaction by means of CCD camera. The presented results indicate that the light intensity recorded close to the substrate can be used as a measure of the intensity of plasma-chemical deposition processes on the substrate surface. |
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