| 接近式光刻衍射光场的快速计算机模拟 |
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| 引用本文： | 陈有梅,郑津津,周洪军,沈连婠,张自军.接近式光刻衍射光场的快速计算机模拟[J].中国科学技术大学学报,2007,37(1):30-34. |
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| 作者姓名： | 陈有梅 郑津津 周洪军 沈连婠 张自军 |
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| 作者单位： | 1. 中国科学技术大学精密机械与精密仪器系,安徽合肥,230026
2. 国家同步辐射实验室,安徽合肥,230029 |
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| 基金项目： | 国家自然科学基金;中国科学院基金 |
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| 摘 要： | 接近式光刻中一般采用柯勒照明系统,并采用蝇眼透镜形成多点光源均匀掩模面的光场分布.利用基尔霍夫衍射理论及多点光源的衍射光场非相干叠加方法,对光刻胶表面的衍射光场进行了快速计算机模拟,并与霍普金斯理论计算结果进行了分析比较.结果表明采用基尔霍夫衍射理论及多点光源的衍射光场非相干叠加的模型不仅快速而且也可以比较准确地模拟接近式光刻的衍射光场分布.
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| 关 键 词： | 接近式光刻 柯勒照明 蝇眼透镜 计算机模拟 |
| 文章编号： | 0253-2778(2007)01-0030-05 |
| 修稿时间： | 10 13 2006 12:00AM |
Computer simulation of diffraction intensity in proximity lithography |
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| CHEN You-mei,ZHENG Jin-jin,ZHOU Hong-jun,SHEN Lian-guang,ZHANG Zi-jun.Computer simulation of diffraction intensity in proximity lithography[J].Journal of University of Science and Technology of China,2007,37(1):30-34. |
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| Authors: | CHEN You-mei ZHENG Jin-jin ZHOU Hong-jun SHEN Lian-guang ZHANG Zi-jun |
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| Institution: | 1. Department o f Precision Machinery and Precision Instrumentation, USTC, He f ei 230026,China; 2. National Synchrotron Radiation Laboratory, Hefei 230029,China |
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| Abstract: | Kohler illumination was used in proximity lithography,and a fly's eye lens was adopted to form multi-point source in order to uniform the light intensity on the mask plane.A fast computer simulation of diffraction intensity on the photoresist surface was performed based on Kirchhoff's diffraction theory and the incoherent super-impose of multi-point source diffraction intensity.Compared with the results based on Hopkins theory,the fast computer simulation results show that the diffraction intensity in proximity lithography may be simulated more rapidly and precisely with the new model. |
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| Keywords: | proximity lithography Kohler illumination fly's eye lens computer simulation |
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