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Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer
Authors:Zhang Guo-Jun  Tanii Takashi  Funatsu Takashi  Ohdomari Iwao
Institution:Nanotechnology Research Center, Waseda University, Waseda Tsurumaki-cho 513, Shinjuku-ku, Tokyo 162-0041, Japan. zhang@kaw.comm.waseda.ac.jp
Abstract:Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.
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