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Observation of Organic Thin Film Surface by Atomic Force Microscopy
Authors:WANG Guang-ming  DING De-sheng  LU Zu-hong  WEI Yu  DING Ying
Affiliation:1. National Laboratory of Molecular and Bioelectronics, Southeast University, Nanjing, 210096, P. R. China;2. Center for Advanced Studies in Science and Technology of Microstructures, Nanjing, 210093, P. R. China;3. Department of Electronic Engineering, Southeast University, Nanjing, 210096, P. R. China
Abstract:The 8-hydroxyquinoline neodymium(Ndq3) organic thin films deposited on the cleaned indium/tin oxide (ITO) at different deposition rates with the same vacuity (133.3×10-5 Pa) were revealed by atomic force microscopy (AFM). Organic devices with one layer of Ndq3 as the e-type conductive material at different deposition rates sandwiched between ITO and aluminum electrodes have been fabricated. respectively. Evidence suggests that the current-voltage (I-V) characteristics were determined by the uniformity of organic film which was controlled by the deposition conditions.
Keywords:8-Hydroxyquinoline neodymium  Thin film  Atomic force microscopy  
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