| 用吸收光谱法测定鎓盐光解生成酸的量子产率 |
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| 引用本文： | 戴光松,吴世康,W. Schnabel.用吸收光谱法测定鎓盐光解生成酸的量子产率[J].影像科学与光化学,1995,13(4):358-361. |
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| 作者姓名： | 戴光松 吴世康 W. Schnabel |
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| 作者单位： | 1. 中国科学院感光化学研究所, 北京100101;2. Hahn-Meitner-Institut GmbH Berlin Germany |
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| 摘 要： | 近年来,鎓盐化合物,如碘鎓盐、硫鎓盐和氧鎓盐等,作为光引发剂在酸催化微电子器件加工技术中得到了广泛的应用。我们曾对它们的稳态和瞬态光解及机理进行过比较详细的研究,也发现它们在光解时能以不同途径生成很强的无机酸(Bronsted酸),进而可引发单体阳离子聚合或高分子薄膜的交联等。很显然,在这一工作中准确测定它们光解时生成酸的量子产率将与微电子器件加工中光刻质量(如分辨率等)密切相关。在过去的工作中,一般采用酸碱滴定法困,即用氢氧化钠,氢氧化钾水溶液测定嗡盐光解生成酸的量子产率,但由于嗡盐在水中溶解度不很理想,因而结果往往不能重复,测定的酸量子产率误差较大,如Pappas用此法测得的三苯基硫嗡盐在254 nm光解生成酸量子产率为0.74,误差在正负20%。
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| 关 键 词： | 光解 盐化合物 吸收光谱法 量子产率 |
| 收稿时间： | 1995-02-22 |
MEASURING QUANTUM YIELDS OF ACID EORMED IN PHOTOLYSIS OF ONIUM SALTS BY USING ABSORPTION SPECTROMETRY |
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| DAI GUANG-SONG,WU SHI-KANG,W. Schnabel.MEASURING QUANTUM YIELDS OF ACID EORMED IN PHOTOLYSIS OF ONIUM SALTS BY USING ABSORPTION SPECTROMETRY[J].Imaging Science and Photochemistry,1995,13(4):358-361. |
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| Authors: | DAI GUANG-SONG WU SHI-KANG W Schnabel |
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| Institution: | 1. Institute of Photographic Chemistry, The Chinese Academy of Sciences, Beijing 100101, P.R. China;2. Hahn-Meitner-Institut GmbH Berlin Germany |
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| Abstract: | Onium salts with non-nucleophilic complex metal halide anions are good phtoto initiators,and have been extensively used in acid-catalyzed semiconductor lithography,Upon UVirradiation of these salts,protonic acid is formed. Measuring quantum yields of acid is veryimportant in order to improve the quality of photoresists. In this work, a new method ofmeasuring quantum yields of acid formed in photolysis of onium salts was described.Theamount of acid produced on irradiation was measured by a non-aqueous photometric methodusing sodium 4-nitrophenoxide as an indicator in acetonitrile standardized with trifluo-romethanesulphonic acid.The results determined have best repetition and higher sensitivitycompared with aqueous base-acid titration. The experimental results have been also discussed. |
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| Keywords: | photolysis onium compounds absorption spectrometry quantum yield |
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