Electroless deposition of gold thin films on silicon for surface-enhanced infrared spectroelectrochemistry |
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| Institution: | 1. Institute for Catalysis, Hokkaido University, N21W10, Kita-ku, Sapporo 001-0021, Japan;2. Graduate School of Engineering, Nagoya Institute of Technology, Gokisocho, Nagoya 466-8555, Japan;1. Graduate School of Engineering, Toyota Technological Institute, 2-12-1 Hisakata, Tempaku, Nagoya 468-8511, Japan;2. Precursory Research for Embryonic Science and Technology (PRESTO), Japan Science and Technology Agency (JST), 4-1-8 Honcho, Kawaguchi, Saitama 332-0012, Japan;3. Institute for Catalysis, Hokkaido University, N-21 W-10, Kita-ku, Sapporo 001-0021, Japan |
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| Abstract: | Electroless (or chemical) deposition technique has been used in preparing Au island film electrodes on Si for in situ infrared spectroscopic studies of the electrochemical interface in attenuated total reflection mode. Owing to surface-enhanced infrared absorption (SEIRA) effect, absorption bands of molecules adsorbed on the chemically deposited films were one order of magnitude as large as those observed on smooth Au electrode surfaces. Although the enhancement factor was identical to that observed on vacuum evaporated Au island films, this simple method is superior to vacuum evaporation method with respect to the adhesion of the film, surface contamination, reproducibility, and cost. |
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