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Determination of hydrogen concentration in amorphous silicon films by nuclear elastic scattering (NES) of 100 MeV 3He2+ |
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| Authors: | M Iwami T Imura A Hiraki T Itahashi T Fukuda M Tanaka |
| Institution: | 1. Department of Electrical Engineering, Osaka University, Suita, Osaka 565, Japan;2. Research Center for Nuclear Physics, Osaka University, Suita, Osaka 565, Japan;3. Department of Physics, Osaka University, Toyonaka, Osaka 560, Japan;4. Kobe Tokiwa Junior College, Nagata, Kobe, 653, Japan |
| Abstract: | Nuclear elastic scattering (NES) of 100 MeV 3He2+ ions was used to determine the amount of hydrogen atoms in hydrogenated amorphous silicon film fabricated by reactive sputtering. The total amount of hydrogen in this film was determined to be (1.12 ± 0.1) x 1022 cm-3 within the accuracy of ～ 10%. |
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