Quenched-in deep levels in boron-doped silicon |
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Authors: | DE Ioannou |
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Institution: | Democritus University of Thrase, School of Engineering, Department of Electrical Engineering, Laboratory of Electrotechnical and Electronic Materials, Xanthi, Greece |
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Abstract: | The DLTS technique was used to study quenched-in deep traps in boron doped silicon crystals, heated at temperatures in the range 700–900°C prior to quenching. The results vary with temperature, demonstrating that the exact temperature up to which the samples are heated prior to quenching plays a determining role on the number of different traps intorduced and their positions in the energy gap, which is often overlooked in the literature. |
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