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Technique for Monolithic Fabrication of Microlens Arrays Integrated with Infrared CCD
Abstract:
Based on scalar diffraction theory, 8-phase-level 256×256 elements diffractive microlens array with element dimension of 50×33 μm2 have been fabricated on the back-side of PtSi(3~5 μm) infrared CCD. The measurement results indicated that the ratio of the signal-to-noise of the infrared CCD with microlens was increased by a factor of 2.8.
Keywords:monolithic integration  infrared CCD  diffractive microlens arrays  ion beam milling
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