Effect of acetic acid on the performance of solution-processed gallium doped indium oxide thin film transistors |
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Authors: | Jee Ho Park Young Bum Yoo Keun Ho Lee Sun Woong Han Won Jin Choi Hong Koo Baik |
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Affiliation: | 1. Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea 2. Advanced Materials Division, Korea Research Institute of Chemical Technology (KRICT), Daejeon, 305-343, Korea
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Abstract: | We investigated a role of acetic acid for solution processed gallium doped indium oxide thin film transistors (TFTs). By adding acetic acid in solution instead of commonly used ethanolamine, electrical performance of GIO TFTs is significantly enhanced. We demonstrated that acetic acid plays a role in enhancing crystallinity, lowering decomposition temperature and reducing hydroxyl groups in the film. The GIO TFTs formed from acetic acid added solution have mobility of 12.68 cm2 V?1 s?1, threshold voltage of ?7.4 V, on/off current ratio of 1.07 × 108 and subthreshold slope of 0.78 V/decade. |
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