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Effect of acetic acid on the performance of solution-processed gallium doped indium oxide thin film transistors
Authors:Jee Ho Park  Young Bum Yoo  Keun Ho Lee  Sun Woong Han  Won Jin Choi  Hong Koo Baik
Affiliation:1. Department of Materials Science and Engineering, Yonsei University, Seoul, 120-749, Korea
2. Advanced Materials Division, Korea Research Institute of Chemical Technology (KRICT), Daejeon, 305-343, Korea
Abstract:We investigated a role of acetic acid for solution processed gallium doped indium oxide thin film transistors (TFTs). By adding acetic acid in solution instead of commonly used ethanolamine, electrical performance of GIO TFTs is significantly enhanced. We demonstrated that acetic acid plays a role in enhancing crystallinity, lowering decomposition temperature and reducing hydroxyl groups in the film. The GIO TFTs formed from acetic acid added solution have mobility of 12.68 cm2 V?1 s?1, threshold voltage of ?7.4 V, on/off current ratio of 1.07 × 108 and subthreshold slope of 0.78 V/decade.
Keywords:
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