内表面栅极等离子体源离子注入TiN薄膜及其特性研究

阐述了栅极增强等离子体源离子注入（GEPSII）方法的基本思想.利用GEPSII方法在45号钢 基底上生成了金黄色氮化钛（TiN_x）膜.对不同条件下的TiN膜做电化学腐蚀，X PS，AES， XRD等分析.电化学腐蚀实验显示TiN薄膜改善了45号钢的耐腐蚀性能5—10倍，且在高气压下 效果更好.结构分析显示TiN膜含有TiO₂，TiN成分，主要沿（111）和（200）晶 向生长，深度分析显示膜的厚度只有二十几纳米，膜质地均匀且在基底有一定的嵌入深度.关键词：腐蚀等离子体源离子注入薄膜氮化钛

TiN coating for inner surface modification by grid enhanced plasma source ion im plantation

Using the new inner surface modification technique named GEPSⅡ(grid-enhanced pl asma source ion implantation), which is designed for inner surface modification of tubular work piece, has successfully produced TiN coating on 0.45% C steel (4 5# steel). By comparing with the uncoated 45# steel sample, the electrochemical corrosion test on the coated 45# steel samples presents about 5—10 times improv ement in their corrosion resistance. Structural analysis shows that the TiN coat ings have preferred crystal orientation(111) and (2000). And the depth of coatin gs is about 20 nm, with part of which embedding in the substrate.