Effects of thermal annealing on titanium oxide films prepared by ion-assisted deposition |
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| Authors: | Cheng-Chung Jaing Hsi-Chao Chen Cheng-Chung Lee |
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| Affiliation: | (1) Department of Optoelectronic System Engineering/Department of Electronic Engineering, Minghsin University of Science and Technology, Hsinchu, 304, Taiwan;(2) Department of Electro-Optical Engineering, De Lin Institute of Technology, Tucheng, 236, Taiwan;(3) Department of Optics and Photonics/Thin Film Technology Center, National Central University, Chungli, 320, Taiwan |
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| Abstract: | Titanium oxide thin films are prepared at a substrate temperature of 250 °C by electron-beam evaporation and ionassisted deposition. The effects of thermal annealing temperatures from 100 to 450 °C on the optical and mechanical properties are studied. The optical and mechanical properties include refractive indices, extinction coefficients, residual stress, surface roughness and crystallization. Experimental results show these properties of titanium oxide films clearly depend on the thermal annealing process. |
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| Keywords: | Titanium oxide films substrate temperature ion-assisted deposition thermal annealing optical properties mechanical properties |
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