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Plasma irradiation effects in phthalocyanine films
Authors:G L Pakhomov  M N Drozdov  N V Vostokov
Institution:

Institute for Physics of Microstructures of the Russian Academy of Sciences, Nizhny Novgorod, GSP-105, Nizhny Novgorod 603950, Russia

Abstract:Plasma irradiation effects in copper phthalocyanine films were examined. The film surface and chemical composition were characterized by means of atomic force microscopy (AFM) and secondary ion mass spectrometry (SIMS), including SIMS profiling.
Keywords:Phthalocyanines  Dry etching  SIMS  AFM  Heterostructures
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