Refractive index behavior of SiO2-P2O5 glass in optical fiber application |
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Authors: | Toshio Katsuyama Tsuneo Suganuma Kōji Ishida Gyōzō Toda |
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Affiliation: | Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo 185, Japan |
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Abstract: | The refractive index of SiO2-P2O5 glass prepared by a modified chemical vapor deposition method is measured using an interference microscope. It is found that the refractive index in bulk form increases linearly at 9.5×10-4 (mol.%)-1 as the P2O5 concentration increases. It is also found that quenching at extremely high speed reduces the refractive index over 2 mol.% P2O5. The wavelength dispersion of the refractive index dn/dλ is constant up to 5 mol.% P2O5 producing a refractive index difference of 5×10-3 compared with fused silica. Consequently, this glass materials is thought to be suitable for wide band-width optical fiber applications. |
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