Determination of the stoichiometry of vanadium nitride films by proton back-scattering |
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| Authors: | J. V. Ramana V. S. Raju A. K. Ray S. Gangadharan R. S. Srinivasa A. N. Chandorkar |
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| Affiliation: | (1) Analytical Chemistry Division B.A.R.C., 85 Bombay, (India);(2) Laser and Plasma Technology Division B.A.R.C., 85 Bombay, (India);(3) Indian Institute of Technology, 85 Bombay, (India) |
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| Abstract: | Vanadium nitride films were grown on stainless steel and silicon, with different nitrogen concentrations by varying the partial pressures of nitrogen in a DC magnetron sputtering set up. These films were characterized for their composition by proton back-scattering and their micro hardness values were correlated with their N/V ratio. |
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