VO2光学薄膜的脉冲激光损伤特性测试

为评价VO2光学薄膜在光电器件中的工作可靠性，搭建了可输出连续渐变激光能量密度的脉冲激光照射实验平台，运用1对1与s对12种激光损伤测试手段进行激光辐射照射实验，采用线性外推法和测量计算法2种方法对实验结果进行了处理并得出VO2薄膜在重复频率10 kHz、中心波长532 nm、脉冲宽度15 ps脉冲激光辐射下的损伤特性。结果表明:VO2薄膜损伤几率与脉冲激光的单脉冲能量密度呈线性关系，重复辐射的激光脉冲对VO2薄膜造成的损伤具有积累效应，且重复辐射的激光脉冲次数越多损伤积累效果越明显。

Pulse laser damage characteristic measurement of VO2 optical thin film

In order to evaluate the operational reliability of the VO2 optical film working in the photovoltaic device, a pulse laser experiment platform which could output gradient laser energy density was set up. The laser irradiation experiment was carried out by using the“1 to 1” and “s to 1” laser damage test means, and the results were processed through the methods of extrapolation and measureme calculation. The experiment obtained the damage characteristics of VO2 thin films under the pulsed laser with a repetition rate of 10 kHz, center wavelength of 532 nm and pulse width of 15 ps. The results indicate that there is a linear relationship between the damage probability of VO2 thin films and the energy density of the single laser pulse, moreover, the damage caused by the laser pulse repeated radiation has the cumulative effect, and the more times laser pulse radiation repeats, the more obvious the cumulative effect of damage is.