双槽法电沉积Cu/Ni多层纳米线有序阵列

以多孔阳极氧化铝（AAO）为模板，采用双槽法电沉积工艺制得高度有序的Cu/Ni多层纳米线阵列。利用扫描电镜（SEM）和透射电镜（TEM）对Cu/Ni多层纳米线进行了表征，观察到纳米线表面平滑，多层结构清晰，各子层厚度均匀，直径约为 100 nm，与AAO模板孔径基本一致。由选区电子衍射（SAED）照片可知，多层纳米线中Cu层和Ni层均为单晶结构。振动样品磁强计（VSM）测试结果表明，Cu/Ni多层纳米线阵列具有明显的垂直磁各向异性，外加磁场垂直和平行于AAO模板表面时，磁滞回线的矩形比分别为 0.701 和 0.101 ，矫顽力分别为 589 Oe和 202 Oe。通过控制铝阳极氧化工艺及电沉积时间，可获得不同直径、不同子层厚度的Cu/Ni多层纳米线阵列。

Electrodeposition of Ordered Arrays of Multilayered Cu/Ni Nanowires by Dual Bath Technique

An ordered multilayered Cu/Ni nanowires array was electrodeposited into the pores of anodic aluminum oxide (AAO) template, with layer thickness in the range of 3 to 100 nm. To avoid codeposition of Cu in the Ni layers, two separate Ni and Cu baths were used. Scanning electronic microscopy (SEM) and transmission electron microscopy (TEM) were used to characterize the morphology of Cu/Ni multilayered nanowires array. The results show that the layer thicknesses are quite uniform and the multilayered structure is clear and regular. The nanowire diameter is about 100 nm, which corresponds to the pore size of the used AAO template. Selected-area electron diffraction (SAED) result demonstrates that those multiplayer wires exhibit single crystal structures. Hysteresis curves for multilayered Cu/Ni nanowires array with the AAO membrane support were tested by using vibrating sample magnetometer (VSM) at room temperature (293 K). It is found that the Cu/Ni nanowires arrays have strong perpendicular magnetic field anisotropy. When the magnetic field is perpendicular or parallel to the AAO template, the squareness ratio is 0.701 or 0.101, and the coercivity is 589 Oe or 202 Oe, respectively. The diameter and the layer thickness of Cu/Ni multilayered wires could be changed according to demands by adjusting the technologic parameters of anodization and electrodeposition.