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Study of microstructure and nanomechanical properties of Zr films prepared by pulsed magnetron sputtering |
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| Authors: | Akash SinghP. Kuppusami R. ThirumurugesanR. Ramaseshan M. KamruddinS. Dash V. GanesanE. Mohandas |
| Affiliation: | a Materials Synthesis and Structural Characterization Section, Physical Metallurgy Group, Indira Gandhi Centre for Atomic Research, Kalpakkam 603 102, India b Surface and Nano Science Division, Indira Gandhi Centre for Atomic Research, Kalpakkam 603 102, India c UGC-DAE Consortium for Scientific Research, Indore 452 017, India |
| Abstract: | The present work studies the effect of substrate temperature on the growth characteristics of zirconium films prepared by pulsed magnetron sputtering. Formation of α-phase of zirconium was observed in the temperature range 300-873 K. X-ray diffraction of Zr films revealed predominantly [0 0 1] texture. It is noticed that crystallite size increases with increasing substrate temperature. Hexagonal shaped crystallites seem to grow along the surface normal of the substrate for the films deposited at 773 K. Nanoindentation measurements showed that the hardness of the films is in the range 6-10 GPa. The scratch test indicated that the films deposited at higher substrate temperatures had excellent bonding with the substrate and no significant critical failure was noticed up to an applied load of 20 N. |
| Keywords: | Sputtering Zirconium X-ray diffraction Nanohardness Scratch test |
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