Chemical bath deposition of Bi2S3 films by a novel deposition system

Bismuth sulfide (Bi₂S₃) films were chemically deposited by a novel deposition system in which ammonium citrate was used as the chelating reagent. Two sulfur source thioacetamide (TA) and sodium thiosulfate (Na₂S₂O₃) were used to prepare Bi₂S₃ films. Both the as-prepared films have amorphous structure. However, annealing can improve the crystallization of the films. The composition of the films prepared by TA and Na₂S₂O₃ are all deviate from the stoichiometric ratio of Bi₂S₃. The Bi₂S₃ films are all homogeneous and well adhered to the substrate. The optical properties of the Bi₂S₃ films are studied. The electrical resistivity of the as-prepared films are all around 7 × 10³ Ω cm in dark, which decreases to around 1 × 10³ Ω cm under 100 mW/cm² tungsten-halogen illumination. After the annealing, the dark resistivity of the Bi₂S₃ film prepared by TA decreases by four magnitudes. In contrast, the dark resistivity of the Bi₂S₃ film prepared by Na₂S₂O₃ only decreases slightly.