Carbon nanosheets by microwave plasma enhanced chemical vapor deposition in CH4-Ar system |
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| Authors: | Zhipeng Wang Mao ShojiHironori Ogata |
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| Institution: | a Institute for Sustainability Research and Education, Hosei University, 2-17-1, Fujimi, Chiyoda-ku, Tokyo 102-8160, Japan
b Department of Chemical Science and Technology, Faculty of Bioscience and Applied Chemistry & Graduate School of Engineering, Hosei University, 3-7-2, Kajino-cho, Koganei, Tokyo 184-8584, Japan |
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| Abstract: | We employ a new gas mixture of CH4-Ar to fabricate carbon nanosheets by microwave plasma enhanced chemical vapor deposition at the growth temperature of less than 500 °C. The catalyst-free nanosheets possess flower-like structures with a large amount of sharp edges, which consist of a few layers of graphene sheets according to the observation by transmission electron microscopy. These high-quality carbon nanosheets demonstrated a faster electron transfer between the electrolyte and the nanosheet surface, due to their edge defects and graphene structures. |
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| Keywords: | Carbon nanosheets Graphene Low temperature MPECVD |
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