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Optical emission spectroscopy by Ar ion sputtering of Ti surface under O2 environment |
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| Authors: | Kenji Motohashi Yuichi SaitohShin-iti Kitazawa |
| Affiliation: | a Department of Biomedical Engineering, Faculty of Science and Engineering, Toyo University, 2100 Kujirai Kawagoe-shi, Saitama 350-8585, Japan b Department of Advanced Radiation Technology, Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency (JAEA), 1233 Watanuki-machi, Takasaki, Gunma 370-1292, Japan c ITER Project Management Group, Division of ITER Project, Fusion Research Development, Japan Atomic Energy Agency (JAEA), Mukoyama 801-1, Naka-shi, Ibaraki 311-0193, Japan |
| Abstract: | Visible light emission from atoms and ions sputtered on a polycrystalline Ti surface was observed under irradiation of 30 keV Ar3+ ions. A number of atomic lines of Ti I and II were observed in the wavelength of 250-850 nm. The intensity of Ti II emission increased 1.3-5.6 times by introducing oxygen molecules at a pressure of 5.8 × 10−5 Pa, whereas that of Ti I decreased 0.5-0.8 times. Factors enhancing or reducing photon intensities were plotted as a function of energy of the corresponding electrons in the excited states for Ti atoms and Ti+ ions. |
| Keywords: | Ion bombardment Sputtering Photon emission |
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