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Mg diffusion in K(Ta0.65Nb0.35)O3 thin films grown on MgO evidenced by Auger electron spectroscopy investigation |
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| Authors: | Q. Simon,V. Bouquet,V. Demange,S. Dé putier,F. WycziskG. Garry,A. ZiaieM. Guilloux-Viry |
| Affiliation: | a Sciences Chimiques de Rennes, UMR 6226 CNRS/Université de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France b Université Européenne de Bretagne, France c Thales Research & Technology, rd. 128, 91767 Palaiseau Cedex, France |
| Abstract: | The diffusion of Mg in pulsed laser deposited K(Ta0.65Nb0.35)O3 thin films epitaxially grown on (1 0 0) MgO single crystal substrate were investigated by Auger electron spectroscopy (AES). A diffusion of Mg from the substrate into the whole thickness (400 nm) of the as-deposited K(Ta0.65Nb0.35)O3 films was observed with an accumulation of Mg at the surface. Ex situ post-annealing (750 °C/2 h) has led to a homogeneous distribution of Mg in all the ferroelectric coating. This strong reaction between film and substrate promotes a doping effect, responsible for the reduction of K(Ta0.65Nb0.35)O3 dielectric losses in comparison with films grown on other substrates. |
| Keywords: | Potassium tantalate niobate KTN PLD AES Mg diffusion Dielectric losses |
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