|
|||||
|
|
Resistless patterning of a chlorine monolayer on a Si(0 0 1) surface with an electron beam |
|
| Authors: | C JeonH-N Hwang H-J ShinC-Y Park C-C Hwang |
| Institution: | a BK21 Physics Research Division and Center for Nanotube and Nanostructured Composites (CNNC) Sungkyunkwan University, Suwon 440-746, Republic of Korea b Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784, Republic of Korea c Department of Energy Science, Sungkyunkwan University, Suwon 440-746, Republic of Korea |
| Abstract: | We achieved electron beam (e-beam) patterning without a photoresist on a Cl-terminated Si(0 0 1) surface. Synchrotron radiation photoemission spectroscopy and scanning photoelectron microscopy were employed to investigate the surface chemical state and pattern formation. The Cl-Si bonds were easily broken by the irradiation with an e-beam of 1 keV, leading to a pattern formation through the adsorption of residual molecules of water and hydrocarbon at the exposed Si dangling bond sites. In addition, we demonstrated the selective adsorption of desired molecules on the surface by e-beam irradiation in environments consisting of different gases, such as oxygen, ammonia, and 1-butanethiol. |
| Keywords: | Synchrotron radiation photoelectron spectroscopy Electron stimulated desorption Silicon Chlorine |
| 本文献已被 ScienceDirect 等数据库收录！ | |