Improving p-type contact characteristics by Ni-assisted annealing and effects on surface morphologic evolution of InGaN LED films grown on Si (1 1 1) |
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Authors: | Guangxu WangChuanbing Xiong Junlin Liu Fengyi Jiang |
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Institution: | a National Engineering Technology Research Center for LED on Silicon Substrate, Nanchang University, Nanjing Road, Nanchan 330047, China b Latticepower (Jiangxi) Corporation, Aixi-lake North Road, Nanchang 330029, China |
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Abstract: | Ni thin layer was deposited to assist to activate p-GaN and then was removed. The process was named Ni-assisted annealing (NA). We investigate the surface morphology and p-type contact behaviors of InGaN LED films grown on Si (1 1 1) substrates. Compared with conventional thermal annealing (TA), NA can improve the p-type contact characteristic at lower anneal temperature and a smaller specific contact resistivity (ρc = 6.1 × 10−5 Ω cm2) employing nonalloy Pt electrode was obtained. A wet etching method using acid-hydrogen peroxide was adopted to boil films surface after activation. We found that some nano-pits appeared on surfaces while original surface step structure was still clearly visible, which shows a defect-selective etching characteristic. Otherwise, we demonstrated that the surface morphology could be affected by NA while independent to TA. Some mechanisms for experimental phenomena were also discussed in the letter. |
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Keywords: | 85 60 Jb 73 61 Ey 81 40 Ef |
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