Pulsed laser ablation of zinc selenide in nitrogen ambience: Formation of zinc nitride films |
| |
Authors: | S. SimiI. Navas R. VinodkumarS.R. Chalana Mohan GangradeV. Ganesan V.P. Mahadevan Pillai |
| |
Affiliation: | a Department of Optoelectronics, University of Kerala, Kariavattom, Trivandrum 695581, Kerala, India b Institute for Sensorics and Information Systems (ISIS), Karlsruhe University of Applied Sciences, Moltkestr. 30, D-76133, Karlsruhe, Germany c UGC-DAE Consortium for Scientific Research, University Campus, Khandwa road, Indore 452001, India |
| |
Abstract: | Zinc nitride (Zn3N2) thin films are prepared using pulsed laser deposition (PLD) from zinc selenide (ZnSe) target at different nitrogen ambient pressures viz. 1, 3, 5, 7 and 10 Pa. The films prepared with nitrogen pressures 1 and 3 Pa are amorphous in nature, whereas the films prepared at 5, 7 and 10 Pa exhibit the presence of cubic bixbyite Zn3N2 structure with lattice parameter very close to bulk of Zn3N2. The particle size calculated by Debye Scherrer's formula is in the nano regime. Surface morphology of the films is studied by SEM and AFM analysis. Optical parameters such as band gap, refractive index and porosity of the films are calculated. Moreover, the present study confers an outlook about how do various factors such as substrate temperature, reactive supplementing gas and laser-target interaction influence the film developing process during pulsed lased deposition. |
| |
Keywords: | Pulsed laser deposition Formation of zinc nitride Discontinuous thin films Cubic bixbyite structure Lattice strain Band gap energy and porosity |
本文献已被 ScienceDirect 等数据库收录! |
|