Effect of annealing temperature on microstructure, hardness and adhesion properties of TiSixNy superhard coatings |
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Authors: | YH Lu JP WangSL Tao ZF Zhou |
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Institution: | a National Centre for Materials Service Safety, University of Science and Technology Beijing, Beijing 100083, PR China b School of Science, Beijing University of Civil Engineering and Architecture, Beijing 100044, PR China c Department of Manufacturing Engineering & Engineering Management, City University of Hong Kong, Kowloon, Hong Kong |
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Abstract: | A series of TiSixNy superhard coatings with different Si contents were prepared on M42 steel substrates using two Ti and two Si targets by reactive magnetron sputtering at 500 °C. These samples were subsequently vacuum-annealed at 500, 600, 700, 800 and 900 °C, respectively. X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), microindenter, Rockwell hardness tester and scratch tester were applied to investigate the microstructure, phase configuration, hardness and adhesion properties of as-deposited and annealed samples. The results indicated that there were two bonds, TiN and Si3N4, in all presently deposited TiSixNy thin films, that structure was nanocomposite of nanocrystalline (nc-) TiN embedded into amorphous Si3N4 matrices. Annealing treatment below 900 °C played a little role in microstructure and hardness of the coatings although it greatly affected those of steel substrates. The film-substrate adhesion strength was slightly increased, followed by an abrupt decrease with increasing annealing temperature. Its value got to the maximum at 600 °C. Annealing had little effect on the friction coefficient with its value varying in the range of 0.39-0.40. |
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Keywords: | TiSixNy Nanocomposite Annealing treatment Microstructure Adhesion |
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