Microstructure, hydrogenation and optical behavior of Mg-Ni multilayer films deposited by magnetron sputtering |
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Authors: | H. ZhangX.L. Wang Y.Q. QiaoX.H. Xia J.P. Tu |
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Affiliation: | State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Zheda Road 38, Hangzhou 310027, China |
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Abstract: | Mg-Ni multilayer films with sequential Mg and Ni layers were prepared by direct current magnetron sputtering. The substrate temperature influences the microstructure of the films greatly. The film deposited at 298 K exhibits multilayered structure, while the film shows nanocrystalline/amorphous composite structure at the deposition temperature of 473 K. The optical properties between hydrogenation/dehydrogenation states of the films were performed using spectrophotometer in visible light region. The film deposited at 473 K can switch from mirror-like metallic state towards brownish yellow transparent state under 0.6 MPa H2 at 298 K, and the optical transmittance modulation reaches up to 20% both at a wavelength of 770 nm and IR region, while the film deposited at 298 K exhibits low optical change, and the optical switching behavior can hardly be found. The extra free energy stored in the boundary of the nanocrystallines benefits the formation of magnesium-based hydride, resulting in the enhancement of the optical switching properties of the Mg-Ni film deposited at 473 K. |
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Keywords: | Mg-Ni alloy Multilayer film Interdiffusion Optical switching property |
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