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Influence of Ti/TiAlN-multilayer designs on their residual stresses and mechanical properties
Authors:E Vogli  W Tillmann  U Selvadurai-Lassl  G Fischer  J Herper
Institution:a Department of Materials Science and Engineering, University of Maryland, College Park, MD 20742, USA
b Institute of Materials Engineering, Technische Universität Dortmund, Leonhard-Euler-Strasse 2, 44227 Dortmund, Germany
Abstract:In this research work, Ti/TiAlN multilayers of various designs were deposited onto substrates pretreated by different etching procedures. The influence of multilayer design and substrate pretreatment on multilayers adhesion, hardness, wear and friction coefficients was systematically analyzed and correlated with residual stresses of these multilayers as well as with residual stresses on the coating-near substrate region, which were analyzed by synchrotron X-ray diffraction at HZB-BESSYII. These investigations show that the adhesion can be improved by a specific etching procedure, which cause increased compressive stress in the coating-near the substrate region. Additionally, it was found, that the multilayer with the thickest ceramic layers has the highest hardness and the lowest wear coefficients as well as the lowest compressive residual stress within studied multilayers.
Keywords:Multilayers  Ti/TiAlN  Etching  Hardness  Residual stresses  Physical vapor deposition (PVD)
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