Physical Vapor Deposition of [EMIM][Tf2N]: A New Approach to the Modification of Surface Properties with Ultrathin Ionic Liquid Films |
| |
Authors: | Till Cremer Manuela Killian J Michael Gottfried Dr Natalia Paape Peter Wasserscheid Prof Dr Florian Maier Dr Hans‐Peter Steinrück Prof Dr |
| |
Institution: | 1. Lehrstuhl für Physikalische Chemie, Universit?t Erlangen‐Nürnberg, Egerlandstra?e 3, 91058 Erlangen (Germany), Fax: (+49)?9131‐8528867;2. Lehrstuhl für Chemische Reaktionstechnik, Universit?t Erlangen‐Nürnberg, Egerlandstra?e 3, 91058 Erlangen (Germany) |
| |
Abstract: | Ultrathin films of the ionic liquid (IL) 1‐ethyl‐3‐methylimidazolium bis(trifluoromethylsulfonyl)imide, EMIM]Tf2N], are prepared on a glass substrate by means of an in situ thermal‐evaporation/condensation process under ultrahigh‐vacuum conditions. By using X‐ray photoelectron spectroscopy (XPS), it is demonstrated that the first layer of the IL film grows two dimensionally, followed by the three‐dimensional growth of successive layers. The first molecular layer consists of a bilayer, with the EMIM]+ cations in contact to the surface and the Tf2N]? anions at the vacuum side. The ultrathin IL films are found to be stable under ambient conditions. |
| |
Keywords: | ionic liquids physical vapor deposition surface chemistry thin films X‐ray photoelectron spectroscopy |
|
|