The Dual Mode Microwave Afterglow Apparatus for Measuring the Electron Temperature Dependence of the Electron‐Ion Recombination

Three dual mode microwave apparatus (one using S ‐band and two using X ‐band) have been developed to determine ambipolar diffusion and electron‐ion recombination rates under conditions such that T_gas = 300K and T_e is varied from 300 K to 6300 K, in the afterglow period of the dc glow discharge. TheTM₀₁₀ cylindrical cavity (in S ‐band) and TM₀₁₁ open cylindrical cavity (X ‐band) are used to determine the electron density during the afterglow period and a non‐resonant waveguide mode is used to apply a constant microwave heating field to the electrons. To test the properties of the apparatus the neon afterglow plasma has been investigated. At T_e = 300 K a value of α (Ne⁺₂) = (1.7± 0.2) × 10^–7cm³/s is obtained which is in good agreement with values of other investigators. Also similar variations of α as T^–0.4_e (S ‐band) and as T^–0.42_e (X ‐band) obeyed over the range 300 ≤ Te ≤ 6300K are in good agreement with some other previous measurements. The simplicity of the X‐band microwave apparatus also allows the measurements of the gas temperature dependency and the study of electron attachment and may be used simultaneously with optical or mass spectrometry investigations. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)