| Abstract: | A system analysis of the influence of the substrate temperature during deposition on two main factors (nanodimensionality
of structural aggregates and high stresses) responsible for the nonequilibrium state of the materials of ion-plasma-deposited
films and coatings has been performed. It has been shown that an increase in the temperature during deposition leads to a
preferred growth of nanocrystallites in the direction of incidence of film-forming particles, which, in turn, results in the
formation of an anisometric crystal structure. The main causes of the generation of high elastic stresses in ion-plasma condensates
are the ion/atom bombardment in the process of deposition (which stimulates the development of compressive stresses) and the
difference in the thermal expansion coefficients of the condensate and substrate materials (which initiates the development
of thermal stresses; the sign is determined by the difference between the thermal expansion coefficients of the condensate
and substrate materials). An increase in the temperature during deposition results in the relaxation of compressive stresses
stimulated by the ion/atom bombardment and in an enhancement of the influence of thermal stresses on the state of the ion-plasma
condensate. This makes it possible to control the stress state of ion-plasma films and coatings by purposefully varying the
substrate temperature during deposition. |
