The reaction between silylene and ammonia: Some gas-phase kinetic and quantum chemical studies

Time-resolved kinetic studies of the reaction of silylene, SiH₂, generated by 193 nm laser flash photolysis of silacyclopent-3-ene, have been carried out in the presence of ammonia, NH₃. Second order kinetics were observed. The reaction was studied in the gas phase at 10 Torr total pressure in SF₆ bath gas at each of the three temperatures, 299, 340 and 400 K. The second order rate constants (laser pulse energy of 60 mJ +) fitted the Arrhenius equation:noindent Experiments at other pressures showed that these rate constants were unaffected by pressure in the range 10–100 Torr, but showed small decreases in value at 3 and 1 Torr. There was also a weak intensity dependence, with rate constants decreasing at laser pulse energies of 30 mJ +. Ab initio calculations at the G3 level of theory, show that SiH₂+NH₃ should form an initial adduct (donor-acceptor complex), but that energy barriers are too great for further reaction of the adduct. This implies that SiH₂+NH₃ should be a pressure dependent association reaction. The experimental data are inconsistent with this and we conclude that SiH₂ decays are better explained by reaction of SiH₂ with the amino radical, NH₂, formed by photodissociation of NH₃ at 193 nm. The mechanism of this previously unstudied reaction is discussed.