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One pot grafting of tetrairon(III) single molecule magnets on silicon
Authors:G Pellegrino  A Motta  A Cornia  I Spitaleri  IL Fragalà  GG Condorelli
Institution:1. Department of Chemistry, University of Catania and INSTM UdR Catania, V.le A. Doria 6, 95125 Catania, Italy;2. Department of Chemistry, University of Modena and Reggio Emilia and INSTM UdR Modena and Reggio Emilia, via G. Campi 183, 41100 Modena, Italy
Abstract:Herein we report on the Si grafting of two Fe4 derivatives, Fe4(Li)2(tmhd)6], in which tmhd is 2,2,6,6-tetramethylheptane-3,5-dionate and H3Li = R–C(CH2OH)3 is a tripodal ligand with R = CH2double bondCH–CH2–O–CH2 (H3L1) and CH2double bondCH–(CH2)9–O–CH2 (H3L2). These complexes were specifically designed to be directly anchored on the H-terminated silicon surface via the hydrosilylation reaction. The complexes were grafted by a one pot route based on the photoinduced hydrosilylation followed by a ligand exchange step in the same reaction solution. The resulting decorated surfaces were characterized using X-ray photoelectron spectroscopy (XPS), attenuated total reflection infrared spectroscopy (ATR-IR) and atomic force microscopy (AFM).
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