The influence of oxygen on the optical properties of RF-sputtered zinc oxide thin films |
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| Authors: | M Gioffr M Angeloni M Gagliardi M Iodice G Coppola C Aruta FG Della Corte |
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| Institution: | aIstituto per la Microelettronica e Microsistemi - Consiglio Nazionale delle Ricerche - Napoli, via P. Castellino 111- 80131 Napoli, Italy;bUniversità “Mediterranea” di Reggio Calabria - Facoltà di Ingegneria - Reggio Calabria, Feo di Vito - 89060 Reggio Calabria, Italy;cCoherentia CNR-INFM and Dip. Ing. Meccanica - Università di Roma “Tor Vergata” Roma, Via del Politecnico 1, I-00133 Roma, Italy |
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| Abstract: | In this article, we investigate the effects of oxygen partial pressure in the deposition chamber on the optical properties of zinc oxide (ZnO) thin films; in particular, we examine the variation of the refractive index with oxygen flux.ZnO thin films were deposited by radio-frequency (RF) magnetron sputtering and studied by means of X-ray diffraction (XRD) and spectroscopic ellipsometry (SE). We have found a preferential c-axis growth of ZnO films, with slightly variable deposition rates from 2.6 to 3.8 Å/s. Conversely, the refractive index exhibits, from ultraviolet (UV) to near infrared (IR), a considerable and almost linear variation when the oxygen flux value in the deposition chamber varies from 0 to 10 sccm. |
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| Keywords: | Zinc oxide Sputtering Optical characterization |
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