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喇曼散射光极值法定金刚石结构薄层的晶向
引用本文:吴华生,劳浦东,邬建根,屈逢源.喇曼散射光极值法定金刚石结构薄层的晶向[J].物理学报,1989,38(1):111-117.
作者姓名:吴华生  劳浦东  邬建根  屈逢源
作者单位:复旦大学物理系
摘    要:本文提出了一个测定任意取向的金刚石结构薄层晶向的方法——喇曼散射光极值法。文中推导了任意取向的金刚石结构薄层的喇曼散射光强与薄层晶向及入射光偏振方向间的函数关系,并利用此函数的极值定出晶向。利用本文方法所得硅单晶定向结果与X射线衍射法定向结果进行了比较。 关键词

关 键 词:金刚石  薄层晶向  散射光极值法
收稿时间:1987-11-11

ORIENTATION DETERMINATION OF THIN CRYSTAL LAYER WITH DIAMOND STRUCTURE BY RAMAN SCATTERING EXTREMA TECHNIQUE
WU HUA-SHENG,LAO PU-DONG,WU JIAN-GEN and QU FENG-YUAN.ORIENTATION DETERMINATION OF THIN CRYSTAL LAYER WITH DIAMOND STRUCTURE BY RAMAN SCATTERING EXTREMA TECHNIQUE[J].Acta Physica Sinica,1989,38(1):111-117.
Authors:WU HUA-SHENG  LAO PU-DONG  WU JIAN-GEN and QU FENG-YUAN
Abstract:A method for determining the orientation of thin crystal layer has been proposed, namely the Raman scattering extrems technique. The intensity of Raman scattered light from the diamond structure thin layer as a function of both the normal of the thin layer and the polarization direction of incident light is derived. The orientation of the thin layer is then determined by means of four extrema of this function. The results obtained by this method, for silicon wafers are compared with that dettermined by the X-ray method.
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