Analysis of laser induced thermal mechanical relationship of HfO_2/SiO_2 high reflective optical thin film at 1064 nm |
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Authors: | Gang Dai Yanbei Chen Jian Lu Zhonghua Shen Xiaowu Ni |
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Affiliation: | School of Science, Nanjing University of Science and Technology, Nanjing 210094, China |
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Abstract: | A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation. |
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