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Analysis of laser induced thermal mechanical relationship of HfO_2/SiO_2 high reflective optical thin film at 1064 nm
Authors:Gang Dai  Yanbei Chen  Jian Lu  Zhonghua Shen  Xiaowu Ni
Affiliation:School of Science, Nanjing University of Science and Technology, Nanjing 210094, China
Abstract:A numerical model is developed for the calculation of transient temperature field of thin film coating induced by a long-pulsed high power laser beam. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated to calculate the thermal field of the film. The thermal-mechanical relationships are discussed to predict the laser damage area of optical thin film under long pulse high energy laser irradiation.
Keywords:
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