XPS,UPS and thermal desorption studies of alcohol adsorption on Cu(110): I. Methanol |
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Authors: | M Bowker RJ Madix |
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Institution: | Department of Chemical Engineering, Stanford University, Stanford, California 94305, USA |
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Abstract: | The adsorption of methanol on clean and oxygen dosed Cu(110) surfaces has been studied using temperature programmed reaction spectroscopy (TPRS), ultra-violet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS). Methanol was adsorbed on the clean surface at 140 K in monolayer quantities and subsequently desorbed over a broad range of temperature from 140 to 400 K. The UPS He (II) spectra showed the 5 highest lying emissions seen in the gas phase spectrum of methanol with a chemisorption bonding shift of the two highest lying orbitais due to bonding to the surface via the oxygen atom with which these orbitals are primarily associated. A species of quite a different nature was produced by heating this layer to 270 K. Most noticeably the UPS spectrum showed only 3 emissions and the maximum coverage of this state was approximately monolayer. The data are indicative of the formation of a methoxy species, thus showing that methanol is dissociated on the clean Cu(110) surface at 270 K. The same dissociated species was observed on the oxygen dosed surface, the main difference in this ease being the production of large amounts of H2CO observed in TPRS at 370 K. |
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