Research on adhesion strength and optical properties of SiC films obtained via RF magnetron sputtering |
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| Institution: | 1. School of Mechanical, Electrical and Information Engineering, Shandong University, Weihai 264200, China;2. School of Space Science and Physics, Shandong University, Weihai, China;3. Suzhou Institute of Shandong University, Suzhou, Jiangsu 215123, China;4. Department of Materials Science, Jilin University, Changchun 130012, China;1. Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic;2. Institute for Problems of Materials Science, Academy of Sciences of Ukraine, 3 Krzhyzhanovsky St., 03142 Kiev, Ukraine;3. Institute of Physics of Academy of Sciences of the Czech Republic, Joint Laboratory of Optics of Palacky University and Institute of Physics of Academy of Science of the Czech Republic, 17. listopadu 12, 772 07 Olomouc, Czech Republic;4. Palacký University, RCPTM, Joint Laboratory of Optics, 17. listopadu 12, 771 46 Olomouc, Czech Republic |
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| Abstract: | SiC is widely used in various mechanical applications as a protective film because of its strength, thermal stability and good mechanical hardness. Here, amorphous SiC thin films with AlN as a buffer layer were deposited on glass and Si substrates through RF magnetron sputtering at different RF powers. The influence of the AlN buffer layer thickness on the morphological and the mechanical properties of the composite films was investigated. Results demonstrate that the AlN buffer layer can effectively improve the adhesion strength of SiC thin films, which has increased gradually from 26.78 N to 37.66 N. The transmittance of SiC thin films was measured using a UV–Vis–NIR spectrophotometer over a spectral range of 300–1200 nm. The average transmittance of SiC films decreases with increasing RF power, and their optical band gap values have varied from 3.31 eV to 3.50 eV. |
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