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Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry
引用本文:Hua Lin XIE Xi Du NIE You Gen TANG. Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry[J]. 中国化学快报, 2006, 17(8): 1077-1080
作者姓名:Hua Lin XIE Xi Du NIE You Gen TANG
作者单位:Hua Lin XIE1,Xi Du NIE2,You Gen TANG2 1Department of Chemistry,Hunan Institute of Technology,Hengyang 421008 2School of Chemistry and Chemical Engineering,Central south university,Changsha 410083
基金项目:湖南省自然科学基金;湖南省教委科研项目
摘    要:Cobalt metal has been used in the production of magnetic alloys, cobalt and nickel based superalloys and sputtering targets in the field of advanced electronic devices1. The determination of trace impurities in high purity cobalt is extremely important be…

关 键 词:高纯度钴 高分辨率感应耦合等离子体质谱分析 痕量杂质 基体效应 光谱干扰 内标
收稿时间:2006-02-22

Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry
Hua Lin XIE,Xi Du NIE,You Gen TANG. Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry[J]. Chinese Chemical Letters, 2006, 17(8): 1077-1080
Authors:Hua Lin XIE  Xi Du NIE  You Gen TANG
Abstract:
Keywords:High resolution inductively coupled plasma mass spectrometry   high purity cobalt   trace impurities   matrix effect   spectral interference   internal standards.
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