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Crystal face specificity of xenon adsorption on iridium field emitters
Authors:BE Nieuwenhuys  WMH Sachtler
Institution:Gorlaeus Laboratoria, Rijksuniversiteit, Leiden, Netherlands
Abstract:Fundamental problems of the adsorption of noble gas atoms on metal surfaces are discussed on the basis of new data of xenon adsorption on well-defined crystal faces of iridium. These data include surface potentials ( = changes in work function), heats of adsorption and their decrease with increasing coverage; they have been obtained by using a field emitter probe-hole assembly. It is found that the heat of adsorption Qhkl is not simply additive in the number of Ir atoms contacting a Xe atom on a given site; in particular for the close-packed faces, Q111 and Q100 are relatively too high. Apparently, strong bonding is favoured by high work function of the adsorbing crystal face. This proves a significant contribution of a charge-transfer no-bond interaction to the adsorption bond. A model of Xe polarization by an electric surface field is rejected, as it predicts the wrong sign for the adsorption dipole. While at low coverage adsorption is confined to sites determined by the atomic topography of the adsorbing surface, several possibilities exist for high coverages. Either a two-dimensional close-packed layer is formed with little or no epitaxial relation to surface topography, or adsorption remains confined to certain sites. The present data favour the former possibility for atomically smooth faces in agreement with recent LEED results. For atomically rough faces however, the smallness of the decrease of Qhkl with coverage seems to favour site adsorption even at high coverage. The latter result is of relevance for surface area determinations by means of “physical” adsorption.
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