Interactions du rhénium à haute température avec N2O sous basse pression

Starting at room temperature, N20 adsorption on rhenium proceeds dissociatively. Oxygen atoms remain on the surface while nitrogen molecules are desorbed. The overall process is characterized by an initial sticking coefficient value equal to 0.3 at 298 °K. In stationary conditions, and in a higher temperature range (> 1200°K) rhenium trioxide and oxygen atoms are the reaction products, depending on oxygen coverage on the surface. When the oxygen coverage is low, atomization, characterized by a reactive sticking probability of 0.2 is the only observable process. All the results are consistent with a model, previously proposed for the system oxygen-rhenium and oxygen-transition metals. The main differences in reaction rates between rhenium and oxygen or N₂O are interpreted in terms of saturation coverages.