Structural and chemical characterisation of titanium deuteride films covered by nanoscale evaporated palladium layers

Thin titanium deuteride (TiD_y) films, covered by an ultra-thin palladium layer, have been compared with the corresponding titanium and palladium films using a combination of scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The TiD_y layers were prepared under ultra-high vacuum (UHV) conditions by precisely controlled deuterium sorption at 298 K on a Ti film evaporated onto a Si(100) substrate. Both Ti and TiD_y films were then covered in situ by a nanoscale Pd layer. It was found that a 10- to 12-nm-thick Pd layer protects the TiD_y films efficiently against extensive air interaction. The morphology of both the surface and bulk Pd/TiD_y (Ti) films have been observed using SEM and cross-sectional TEM analysis, respectively. A polycrystalline bulk morphology in both Ti and TiD_y films accompanied by a fine-grained Pd surface was observed. High-magnification cross-sectional TEM images reveal the TiD_y film to be plastically deformed leading to an increase in the roughness of the top Pd layer. Complex structures, including Moiré patterns, have been identified within the Pd/TiD_y interface. The chemical nature of this interface has been analysed after partial sputtering of the Pd top layer using XPS. Besides TiD_y and Pd, TiO and PdO were found to be the main chemical species in the interface region of the Pd/TiH_y film. The XPS valence-band spectra of the Pd/TiD_y interface reveal electronic features characteristic of a Pd–Ti bimetallic structure.