High performance solution-processed indium oxide thin-film transistors

In2O3 thin-film transistors (TFTs) were fabricated on various dielectrics SiO2, self-assembled nanodielectrics (SANDs)] by spin-coating In2O3 film precursor solutions consisting of ethanolamine (EAA) and InCl3 in methoxyethanol. Optimized film microstructures are characterized by the high-mobility In2O3 00 L orientation and are obtained only within a well-defined range of base: In3+ molar ratios. Electron mobilities as high as approximately 44 cm2 V(-1) s(-1) are measured for n+-Si/SAND/In2O3/Au devices using an EAA/In3+ molar ratio = 10. This result combined with Ion/Ioff ratios of approximately 10(6) and <5 V operating voltages is encouraging for high-speed applications.In2O3 thin-film transistors (TFTs) were fabricated on various dielectrics SiO2, self-assembled nanodielectrics (SANDs)] by spin-coating In2O3 film precursor solutions consisting of ethanolamine (EAA) and InCl3 in methoxyethanol. Optimized film microstructures are characterized by the high-mobility In2O3 00 L orientation and are obtained only within a well-defined range of base: In3+ molar ratios. Electron mobilities as high as ~44 cm2 V(-1) s(-1) are measured for n+-Si/SAND/In2O3/Au devices using an EAA/In3+ molar ratio = 10. This result combined with Ion/Ioff ratios of approximately 10(6) and <5 V operating voltages is encouraging for high-speed applications.