| Surface characteristics of SiO_2-TiO_2 strip fabricated by laser direct writing |
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| 作者姓名： | 李爱魁 王泽敏 刘家骏 曾晓雁 王春霞 陈弘达 |
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| 作者单位： | Wuhan National Laboratory for Optoelectronics Huazhong University of Science and Technology，Wuhan National Laboratory for Optoelectronics Huazhong University of Science and Technology，Wuhan National Laboratory for Optoelectronics Huazhong University of Science and Technology，Wuhan National Laboratory for Optoelectronics Huazhong University of Science and Technology，State Key Laboratory for Integrated Optoelectronics Institute of Semiconductors Chinese Academy of Sciences，State Key Laboratory for Integrated Optoelectronics Institute of Semiconductors，Chinese Academy of Sciences，Wuhan 430074，Wuhan 430074，Wuhan 430074，Wuhan 430074，Beijing 100083，Beijing 100083 |
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| 基金项目： | Hi-Tech Research and Development Program of China under Grant No.2005AA311030 |
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| 摘 要： | SiO_2-TiO_2 sol-gel films are deposited on SiO_2/Si by dip-coating technique.The SiO_2-TiO_2 strips are fabricated by laser direct writing using an ytterbium fiber laser and followed by chemical etching.Surface structures,morphologies and roughness of the films and strips are characterized.The experimental results demonstrate that the SiO_2-TiO_2 sol-gel film is loose in structure and a shrinkage concave groove forms if the film is irradiated by laser beam.The surface roughness of both non-irradiated and laser irradiated areas increases with the chemical etching time.But the roughness of laser irradiated area increases more than that of non-irradiated area under the same etching time.After being etched for 28 s,the surface roughness value of the laser irradiated area increases from 0.3 nm to 3.1 nm.
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