Vacuum ultra-violet spectroscopic ellipsometry study of sputtered BeZnO thin films |
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Authors: | Jebreel M Khoshman Martin E Kordesch |
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Institution: | aDepartment of Physics, Al-Hussein Bin Talal University, Ma’an, Jordan;bDepartment of Physics and Astronomy, Ohio University, Athens, OH 45701, USA |
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Abstract: | This paper reports on a systematic investigation of the optical properties of BeZnO thin films fabricated by radio frequency reactive magnetron sputtering technique using vacuum ultraviolet spectroscopic ellipsometry (VUV-SE). The thicknesses and optical constants of the thin films were determined in the wavelength range 138–1650 nm, using VUV-SE through the Tauc–Lorentz and Gaussian models. Refractive indices and extinction coefficients of the thin films were determined to be in the range n = 1.58–1.99 and κ = 1.0 × 10−27–0.37, respectively. The absorption coefficient and the optical bandgap energy were then calculated. Measurement of the polarized optical properties reveals a high transmissivity (>90%) and very low absorptivity (<4%) for BeZnO films in the visible and near infrared regions at different angles of incidence. From the angle dependence of the p-polarized reflectivity we deduced a Brewster angle of about 58.5°. |
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Keywords: | VUV Optical constants Amorphous BeZnO Sputtering |
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