Phase measuring profilometry based on elliptically pattern grating |
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Authors: | Xintian Bian Junpeng Xue Ju Cheng Baowei Ji Hualing Yu Xianyu Su Wenjing Chen |
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Institution: | 1. School of Physics and Electronic Electrical Engineering and Jiangsu Key Laboratory for Chemistry of Low-Dimensional Materials, Huaiyin Normal University, Huaian 223300, China;2. Department of Opto-Electronic, Sichuan University, Chengdu 610064, China |
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Abstract: | The present study proposes a new method for measuring the surface shape of an object using elliptically pattern grating projection. Based on phase measuring profilometry (PMP), elliptically pattern grating is projected on the surface of the object to measure its shape in 3D. The computing formula for solving the phase by the phase-shifting fringe method is derived, and the 3D shape formula for the altitude is reestablished. The error-contrastive analysis of the object's surface shape is re-established based on the proposed method and traditional PMP. The proposed method was shown to have a strong anti-noise ability and able to measure objects under high noise. More accurate measurement results were obtained by computer simulation and experiment to verify the feasibility of the proposed method. |
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Keywords: | Information optics Phase measuring profilometry Fringe analysis Elliptically pattern grating Phase unwrap |
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