The use of “actinometer” gases in optical diagnostics of plasma etching mixtures: SF6-O2 |
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Authors: | Riccardo d'Agostino Vincenzo Colaprico Francesco Cramarossa |
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Affiliation: | (1) Centro di Studio per la Chimica dei Plasmi, C.N.R. Istituto di Chimica Generale ed Inorganica, Universita di Bari, Via Amendola 173, 70126 Bari, Italy |
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Abstract: | The spectroscopic emission intensities from excited F atoms in SF6-O2 discharges at 1 torr have been correlated to the densities of atoms in their ground electronic state by measuring the excitation efficiencies of the electrons in the energy range 11 to 17 eV with a method which essentially consists in the analysis of the emission of Ar or N2, added as actinometer gases to the discharge mixtures. The general applicability of the method has been tested by a direct titration of F atoms with chlorine. The spectroscopic analysis has allowed the determination of useful information on the trends of both the electron densities and their energies as a function of the oxygen percent in the feed. |
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Keywords: | Plasma etching (SF6-O2) spectroscopic analysis actinometer gases |
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