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Study of Thin Oxide Films by Electron, Ion and Synchrotron Radiation Beams |
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| Authors: | Väino Sammelselg Eero Rauhala Kai Arstila Alex Zakharov Jaan Aarik Arvo Kikas Juhan Karlis Aivar Tarre Anni Seppälä Jelena Asari Indrek Martinson |
| Institution: | Institute of Physics, University of Tartu, Riia 142, 51014 Tartu, Estonia, EE Accelerator Laboratory, University of Helsinki, P.O. Box 9, FIN-00014 Helsinki, Finland, FI MAX-lab, National Laboratory for Nuclear Physics and Synchrotron Radiation Research, P.O. Box 118, SE-22100 Lund, Sweden, SE Institute of Materials Science, University of Tartu, T?he 4, 51010 Tartu, Estonia, EE Department of Physics, Lund University, S?lvegatan 14, SE-22362, Sweden, SE |
| Abstract: | Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures. |
| Keywords: | : Oxide films EPMA RBS TOF-ERDA scanning photoelectron microscopy |
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