Determination of antimony dopant and some ultra-trace elements in semiconductor silicon by atomic absorption spectrometry with introduction of solid samples into the furnace |
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Authors: | J.B. Headridge D. Johnson K.W. Jackson J.A. Roberts |
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Affiliation: | Department of Chemistry, The University, Sheffield S3 7HF Great Britain;Department of Chemistry, Sheffield City Polytechnic, Sheffieid S1 1 WB Great Britain;Philips Research Laboratories, Redhill, Surrey RH1 5HA Great Britain |
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Abstract: | Antimony as a dopant at a level of ca. 35 atom/106 atoms (ppm, atomic) and ultra-trace concentrations of lead and manganese (<0.02 ppm, atomic) are determined in semiconductor silicon by atomic absorption spectrometry after introduction of milligram samples of silicon to a pyrolytically-coated graphite furnace. Calibration was done with standard aqueous solutions. Iron, silver, zinc and cadmium were sought but were at concentrations below the limits of detection. The graphite microboats used for sample introduction were useful for only 3–10 samples because of silicon carbide formation. |
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